Application of UV, H2O2 , H2O2/UV, Fe(II)/H2O2 and Fe(II)/H2O2/UV process for oxidation of organic compounds in printed circuit boards wastewater
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The paper deals with possible use of acidification and UV, H2O2 , H2O2/UV, Fe(II)/H2O2 and Fe(II)/H2O2/UV (Fenton and Photo-Fenton) process for purifying contaminated printed circuit boards wastewater (pH=10.5, Chemical Oxygen Demand, COD=5 980 mg O2/L, Total Organic Carbon, TOC=2 100 mg/L). Application of acidification and Photo-Fenton process was allowed to decrease COD (98.5%) and TOC (98.1%) in treated wastewater.
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