Improving computer simulation of vacuum pumping process of the plasma sputtering system
Computer simulation in the chemical technology and engineering
3rd International Scientific Conference «Chemical Technology and Engineering»: Proceedings – June 21–24th, 2021, Lviv, Ukraine – Lviv: Lviv Polytechnic National University, 2021, pp. 46–47
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First published on this website: 12.04.2021 - 12:38
Abstract
The aim of the research is to improve mathematical model of the computer simulation of the vacuum pumping process. This is implemented by introducing additional blocks of operators, using of which allows to achieve optimum modes of carrying out the technological process of vacuum sputtering of SiO2 on polymeric surfaces.
Keywords
References
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- Sheremeta, R.M. (2011). Computer simulation of the vacuum systems pumping technological process. Lviv Polytechnic National University bulletin №713 "Optimization of production processes and technical control in mechanical engineering and instrument making", 132-137.
First published Full Text (12.04.2021 - 12:38)
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