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Sedimentation of Silver and Palladium on the Silicon Surface by Galvanic Replacement

Maryana Shepida1 maryana_shepida [at] ukr.net
Oksana Dobrovetska2 oksanadobrovetska [at] gmail.com
  1. Chemistry and Technology of Inorganic Substances Department, Lviv Polytechnic National University, Ukraine, Lviv, S. Bandery street 12
  2. Chemical Engineering Department, Lviv Polytechnic National University, Ukraine, Lviv, S. Bandery street 12
Abstract 

The results of investigations of the process of precipitation of micro- and nanosized particles of silver and palladium on the surface of silicon by electroplating substitution are presented. The conditions of the process, in which a nanosized precipitate is formed in the environment of organic aprotic solvents, is established. The influence of the concentration of metal ions in the solution, temperature and duration of galvanic substitution on the morphology of the modified surface, the geometry of the sediment particles and their distribution in size have been studied.

Keywords 
galvanic replacement
nanoparticles
silver
palladium
silicon surface
aprotic solvents
References 

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